Skip to main content
Log in

The effect of deposition conditions on the refractive index of LTCVD SiO2 films

  • Published:
Journal of Materials Science Letters

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

References

  1. N. GOLDSMITH and W. KERN,RCA Rev. 28 (1967) 1531.

    Google Scholar 

  2. E. A. TAFT,J. Electrochem. Soc. 126 (1977) 1729.

    Google Scholar 

  3. C. COBIANU and C. PAVELESCU, ibid.130 (1983) 1888.

    Google Scholar 

  4. Idem, Thin Solid Films 102 (1983).

  5. C. PAVELESCU, C. COBIANU and A. VANCU,J. Electrochem. Soc. 130 (1983) 975.

    Google Scholar 

  6. C. COBIANU and C. PAVELESCU,Thin Solid Films 117 (1984) 211.

    Google Scholar 

  7. W. A. PLISKIN,J. Vac. Sci. Technol. 14 (1977) 1064.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Cobianu, C., Pavelescu, C. & Paunescu, A. The effect of deposition conditions on the refractive index of LTCVD SiO2 films. J Mater Sci Lett 4, 1419–1420 (1985). https://doi.org/10.1007/BF00720117

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00720117

Keywords

Navigation