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Nitriding of tantalum

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Metal Science and Heat Treatment Aims and scope

Conclusions

  1. 1.

    The diffusion of nitrogen in tantalum in the nitriding process at 600–1000°C occurs with the formation of nitride phases and the subsequent growth of their layers. The hexagonal nitrides TaN and Ta2N form on the surface of the nitrided metal, and a zone of the solid solution of nitrogen in tantalum forms at greater depths.

  2. 2.

    The temperature dependence of the thickness of the diffusion zone located beneath the nitride layer is altered at nitriding temperatures above 850°C (the hardness decreases); this is explained by the formation of various modifications of the outer nitride; tantalum should therefore be nitrided at temperatures no higher than 850°C to obtain the required diffusion zone.

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Authors
  1. D. A. Prokoshkin
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  2. T. A. Voronova
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  3. A. S. Gorbova
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  4. V. N. Kashirtsev
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Additional information

Moscow N. E. Bauman Advanced Technical School. Translated from Metallovedenie i Termicheskaya Obrabotka Metallov, No. 5, pp. 32–35, May, 1984.

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Prokoshkin, D.A., Voronova, T.A., Gorbova, A.S. et al. Nitriding of tantalum. Met Sci Heat Treat 26, 357–360 (1984). https://doi.org/10.1007/BF00707409

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  • DOI: https://doi.org/10.1007/BF00707409

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