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CARS study of SiH4−NH3 reaction process in glow discharge plasma

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Abstract

We have investigated the glow discharge plasma of SiH4−NH3 mixture by CARS. The decomposition rate of NH3 is linearly dependent on SiH4 partial pressure but that of SiH4 is not affected by the mixing ratio.

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Authors and Affiliations

  1. Komatsu Technical Research Center, Shinomiya, 254, Hiratsuka, Japan

    K. Kajiyama & K. Saito

  2. Institute for Laser Science, University of Electro-Communications Chofu, 182, Tokyo, Japan

    K. Usuda & S. S. Kano

  3. Research Laboratory of Resources Utilization, Tokyo Institute of Technology, Nagatsuta, 227, Yokohama, Japan

    S. Maeda

Authors
  1. K. Kajiyama
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  2. K. Saito
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  3. K. Usuda
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  4. S. S. Kano
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  5. S. Maeda
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Kajiyama, K., Saito, K., Usuda, K. et al. CARS study of SiH4−NH3 reaction process in glow discharge plasma. Appl. Phys. B 38, 139–142 (1985). https://doi.org/10.1007/BF00697453

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  • DOI: https://doi.org/10.1007/BF00697453

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