Applied Physics B

, Volume 48, Issue 5, pp 405–410 | Cite as

The effect of preionization electron number density on avalanche completion time

Contributed Papers


Laser output of discharge excimer lasers is related to the avalanche completion timetA. The important role of preionization electron number densityne(0) in reducingtA is then considered. A simple two-stage model is proposed to describe the electron avalanche process under marginalE/n conditions. The theoretical predictions according to the two stage model are in good agreement with the experiments. That vigorous preionization is critical to stable operation of large aperture, high pressure discharge devices is concluded.


42.55.G 52.80.H 


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    J.I. Levatter, S.C. Lin: J. Appl. Phys.51, 210 (1980)Google Scholar
  2. 2.
    C.E. Zheng, D. Lo, S.C. Lin: Appl. Phys. B41, 31 (1986)Google Scholar
  3. 3.
    M. Steyer, H. Voges: Appl. Phys. B42, 155 (1987)Google Scholar
  4. 4.
    B. Lacour, C. Vannier: J. Appl. Phys.62, 754 (1987)Google Scholar
  5. 5.
    R.S. Taylor: Appl. Phys. B41, 1 (1986)Google Scholar
  6. 6.
    S. Sumida, K. Kumitomo, M. Kaburagi, M. Obara, T. Fujioka, K. Sato: J. Appl. Phys.52, 2682 (1981)Google Scholar
  7. 7.
    D.E. Rothe, C. Wallace, T. Petach: AIP Conf. Proc.100, 33 (Excimer Lasers) ed. by C.K. Rhodes, H. Egger, H. Pummer, Lake Tahoe, Nevada (1983)Google Scholar
  8. 8.
    H. Shields, A.J. Alcock, R.S. Taylor: Appl. Phys. B31, 27 (1983)Google Scholar
  9. 9.
    S.C. Lin, Q.H. Lou, Q.S. He: J. Quant. Spectrosc. Radiat. Transfer33, 133 (1985)Google Scholar
  10. 10.
    Y.S. Wang: Ph. D. Dissertation, UC San Diego (1982)Google Scholar
  11. 11.
    L.F. Champagne, A.J. Dudas, N.W. Harris: J. Appl. Phys.62, 1576 (1987)Google Scholar
  12. 12.
    W.H. Long, Jr., M.J. Plummer, G.A. Strappaerts: Appl. Phys. Lett.43, 735 (1983)Google Scholar
  13. 13.
    P.J. Chantry:Applied Atomic Collision Physics Vol. 3,Gas Lasers, ed. by E.W. MacDaniel, W.L. Nighan (Academic, New York 1982) Chap. 2Google Scholar
  14. 14.
    D. Lo: Ph. D. Dissertation, UC San Diego (1988)Google Scholar
  15. 15.
    L.A. Levin, S.E. Moody, E.L. Klosterman, R.E. Center, J.J. Ewing: IEEE J. QE-17, 2282 (1981)Google Scholar
  16. 16.
    H. Hokazono, K. Midorikawa, M. Obara, T. Fujioka: J. Appl. Phys.56, 680 (1984)Google Scholar
  17. 17.
    S.C. Lin, C.E. Zheng, D. Lo, J. Matsumoto, S.B. Zhu: Appl. Phys. B40, 15 (1986)Google Scholar

Copyright information

© Springer-Verlag 1989

Authors and Affiliations

  • D. Lo
    • 1
  1. 1.Space Power Inc.San JoseUSA

Personalised recommendations