Abstract
The oxidation behavior of pure Cr and Cr implanted with Y was studied as a function of temperature (900 and 1025°C) and ion-implantation dose (1×1015 and 2×1016 Y ions/cm2). The microstructures of the Cr2O3 scales were affected by both of the variables studied. Yttrium ions segregated at the grain boundaries in the Cr2O3 scales formed on the implanted alloys and the concentration of Y at the grain boundaries decreased with a decrease in the dose of implanted Y. The mechanism of growth of the Cr2O3 scales was altered by the presence of the Y ions at the Cr2O3 grain boundaries only when a critical concentration of Y at the grain boundaries was exceeded.
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Cotell, C.M., Yurek, G.J., Hussey, R.J. et al. The influence of grain-boundary segregation of Y in Cr2O3 on the oxidation of Cr metal. II. Effects of temperature and dopant concentration. Oxid Met 34, 201–216 (1990). https://doi.org/10.1007/BF00665015
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DOI: https://doi.org/10.1007/BF00665015