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Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 38, No. 4, pp. 543–550, April, 1983.
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Goncharenko, A.A., Slovetskii, D.I. & Shelykhmanov, E.F. The role of oxygen additions in the plasma etching of silicon in tetrafluoromethane and elegas (SF6). J Appl Spectrosc 38, 387–393 (1983). https://doi.org/10.1007/BF00662344
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DOI: https://doi.org/10.1007/BF00662344