Colloid and Polymer Science

, Volume 274, Issue 12, pp 1137–1144 | Cite as

The influence of an acid treatment on the surface charge density of silica gel

  • J. Sonnefeld
Original Contribution

Abstract

The influence of an acid treatment on the pore structure as well as on the surface charge density of porous silica was investigated. It is shown that this treatment causes only small changes of the pore structure. Positive values of the surface charge density at pH>4 are interpreted in terms of surface impurities consisting of Na+ ions resulting from the synthesis of the gel from sodium silicate solution. This effect is strongly influenced by the acid treatment. The surface charge density parameters were evaluated on the basis of the triple-layer model for the electrical double layer. Here two different mechanisms of counterion attachment in the inner Helmholtz plane are discussed.

Key words

Surface charge density silica gel potentiometric titration triple-layer model 

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References

  1. 1.
    Verwey EJW, Overbeek JThG (1948) Theory of the Stability of Lyophobic Colloids. Elsevier, AmsterdamGoogle Scholar
  2. 2.
    Sonnefeld J, Vogelsberger W, Rudakoff G (1991) Chem Phys Lett 176:309–314Google Scholar
  3. 3.
    Jacobasch H-J, Kaden H (1983) Z Chem 23:81–91Google Scholar
  4. 4.
    Buevich YuA, Zubarev AYu (1989) Kolloidn Zh 51:1054–1061Google Scholar
  5. 5.
    Emmett S, Lubetkin SD, Vincent B (1989) Colloids Surf 42:139–153Google Scholar
  6. 6.
    Okubo T (1990) J Phys Chem 94: 1962–1966Google Scholar
  7. 7.
    Vogelsberger W, Seidel A, Rudakoff G (1992) J Chem Soc Faraday Trans 88: 473–476Google Scholar
  8. 8.
    House WA, Hickinbotham LA (1992) J Chem Soc Faraday Trans 88:2021–2026Google Scholar
  9. 9.
    Vogelsberger W, Schütze D, Rudakoff G (1987) Silikattechnik 38:3–5Google Scholar
  10. 10.
    Ülkü S, Balköse D, Baltacboglu H (1993) Colloid Polym Sci 271:709–713Google Scholar
  11. 11.
    Lyklema J (1991) Pure Appl Chem 63:895–906Google Scholar
  12. 12.
    Noh JS, Schwarz JA (1989) J Colloid Interface Sci 130:157–164Google Scholar
  13. 13.
    Ahmed SM (1966) Can J Chem 44: 1663–1670Google Scholar
  14. 14.
    Ahmed SM (1969) J Phys Chem 73: 3546–3555Google Scholar
  15. 15.
    Unger KK, Lork KD, Pfleiderer B, Albert K, Bayer E (1991) Chromatogr 556:395–406Google Scholar
  16. 16.
    Iler RK (1982) The Chemistry of Silica. Wiley, New YorkGoogle Scholar
  17. 17.
    Janusz W, Dawidowicz AL, Szczypa J (1991) J Mater Sci 26:4865–4868Google Scholar
  18. 18.
    Davis JA, James RO, Leckie JO (1978) J Colloid Interface Sci 63:480–499Google Scholar
  19. 19.
    Zalaz S, Kallay N (1992) J Colloid Interface Sci 149:233–240Google Scholar
  20. 20.
    Kosmulski M (1993) Pol J Chem 67: 1831–1839Google Scholar
  21. 21.
    Titulaer MK, Kegel WK, Jansen JBH, Geus JW (1994) J Non-Cryst Solids 170:128–133Google Scholar
  22. 22.
    Brunauer S, Emmett PH, Teller E (1938) J Am Chem Soc 60:309–319Google Scholar
  23. 23.
    Barrett EP, Joyner LC, Halenda PP (1951) J Am Chem Soc 73:373–380Google Scholar
  24. 24.
    Sonnefeld, J, Göbel A, Vogelsberger W (1995) Colloid Polym Sci 273:926–931Google Scholar
  25. 25.
    Sonnefeld J (1993) J Colloid Interface Sci 155:191–199Google Scholar
  26. 26.
    Stadler M, Schindler PW (1993) Clay Clay Miner 41:288–296Google Scholar
  27. 27.
    Hayes KF, Redden G, Ela W, Leckie JO (1991) J Colloid Interface Sci 142:448–469Google Scholar
  28. 28.
    Lyklema J (1987) In: Tadros ThF (ed) Solid/Liquid Dispersions. Academic Press, London, pp 63–90Google Scholar
  29. 29.
    Yates DE, Levine S, Healy TW (1974) J Chem Soc Faraday Trans I 70:1807–1818Google Scholar
  30. 30.
    Healy TW, White LR (1987) Adv Colloid Interface Sci 9:303–345Google Scholar
  31. 31.
    Bousse L, de Rooij NF, Bergveld P (1983) Surf Sci 135:479–496Google Scholar
  32. 32.
    James RO, Davis JA, Leckie JO (1978) J Colloid Interface Sci 65:331–344Google Scholar
  33. 33.
    Scales PJ, Grieser F, Healy TW, White LR, Chan DYC (1992) Langmuir 8: 965–974Google Scholar
  34. 34.
    Miklavic SJ, Ninham BW (1990) J Colloid Interface Sci 134:305–311Google Scholar
  35. 35.
    Stern O (1924) Z Elektrochem 30: 508–516Google Scholar
  36. 36.
    Zhang ZZ, Sparks DL, Scrivner NC (1994) J Colloid Interface Sci 162: 244–251Google Scholar

Copyright information

© Steinkopff Verlag 1996

Authors and Affiliations

  • J. Sonnefeld
    • 1
  1. 1.Institut für Physikalische ChemieFriedrich-Schiller-Universität JenaJenaFRG

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