Diffusion in a bimetal having different concentrations of silicon

Conclusions

• 1. The investigation of diffusion of silicon in a three-layer ribbon containing 2.7% Si in the outer layers and 5.3% Si in the middle layer showed that the silicon concentration becomes completely uniform within a thickness of 0.35 mm as the result of annealing at 1100°C for a short time.

• 2. The method of producing cold-rolled ribbons of layered materials followed by diffusional annealing proposed here is quite well suited for the preparation of cold-rolled transformer steel containing 4% and more Si.

• 3. Rolling and heat treatment of the multilayer ribbon do not require any special equipment or additional expenditure of time for uniformization annealing and can be carried out with the existing facilities for producing cold-rolled transformer steel.