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Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 34, No. 2, pp. 329–334, February, 1981.
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Seleznev, B.I., Moskalev, G.Y. & Tkal', V.A. Effects of ion implantation on the structures of silicon dioxide films made by various methods. J Appl Spectrosc 34, 237–241 (1981). https://doi.org/10.1007/BF00635215
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DOI: https://doi.org/10.1007/BF00635215