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The angular distribution of sputtered atoms and the influence of topographic features

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Journal of Materials Science Letters

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References

  1. U. LITTMARK and W. O. HOFER,J. Mater. Sci. 13 (1978) 2577.

    Google Scholar 

  2. Y. YAMAMURA, C. MOSSNER and H. OECHSNER,Rad. Eff. 105 (1987) 31.

    Google Scholar 

  3. K. RODELSPERGER and A. SCHARMANN,Nucl. Instr. and Meth. 132 (1976) 355.

    Google Scholar 

  4. Wang ZHENXIA, Pan JISHENG, Zhang JIPING and Tao ZHENLAN,Nucl. Sci. Tech. 4 (1993) 74.

    Google Scholar 

  5. Pan JISHENG, Wang ZHENXIA, Tao ZHENLAN and Zhang JIPING,Nucl. Instr. and Meth. B67 (1992) 514.

    Google Scholar 

  6. P. HUCKS, G. TOCKLIN, E. VIETZKE and K. VAGELBRUCH,J. Nucl. Mater. 76 (1978) 736.

    Google Scholar 

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Zhenxia, W., Jisheng, P., Jiping, Z. et al. The angular distribution of sputtered atoms and the influence of topographic features. J Mater Sci Lett 13, 1585–1587 (1994). https://doi.org/10.1007/BF00626517

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  • DOI: https://doi.org/10.1007/BF00626517

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