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Sputtering induced topography development on f.c.c. metals

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Abstract

The generation and development of surface features by ion bombardment induced sputtering erosion of f.c.c. metals is reviewed. Studies with polycrystalline substrates reveal the plethora of individual features, both etch pits and cones and the repetitive features, such as ripple trains, which form differently on different crystallite surfaces. Studies with well defined single crystals clarify the origins of such features and the relative independence of their habit on ion species and substrate material.

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Author notes

  1. J. L. Whitton

    Present address: Physics Department, Stirling Hall, Queen's University, K7L 3N6, Kingston, Ontario, Canada

Authors and Affiliations

  1. Department of Electronic and Electrical Engineering and Thin Film and Surface Research Centre, University of Salford, M5 4WT, Salford, UK

    G. Carter, M. J. Nobes & J. L. Whitton

  2. Physics Laboratory II, HC Ørsted Institute, University of Copenhagen, Universitetsparken 5, DK-2100, Copenhagen, Denmark

    J. L. Whitton

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Carter, G., Nobes, M.J. & Whitton, J.L. Sputtering induced topography development on f.c.c. metals. Appl. Phys. A 38, 77–95 (1985). https://doi.org/10.1007/BF00620458

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