Skip to main content
SpringerLink
Log in

Ion beam exposure of resists

I. Statistical limitations

  • Contributed Papers
  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract

Problems caused by the statistical variation of the number of exposing ions in ionbeam lithography are discussed. Using Poisson statistics, the minimum dose required for exposure as a function of resist sensitivity and minimum feature size is calculated. It is found that, although ion-beam resists show a very high sensitivity of 1011 to 1013,cm−2, it would be possible to use still more sensitive resists and obtain submicron linewidth resolution.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. R.L.Seliger, R.L.Kubena, R.O.Olney, J.W.Ward, V.Wang: J. Vac. Sci. Technol.16, 1610 (1980)

    Google Scholar 

  2. D. B.Rensch, R. L.Seliger, G.Csanky, R. D.Olney, H. L.Stover: J. Vac. Sci. Technol.16, 1897 (1979)

    Google Scholar 

  3. M.Komuro, N.Atoda, H.Kawakatsu: J.Electrochem. Soc.126, 483 (1979)

    Google Scholar 

  4. T.M.Hall, A.Wagner, L.F.Thompson: J. Vac. Sci. Technol.16, 1889 (1979)

    Google Scholar 

  5. K.Morikawa, H.Aritome, S.Namba: Microcircuits Engineering, Aachen (1979)

  6. H.Ryssel, H.Kranz, K.Haberger, J.Bosch: Microcircuit Engineering, Amsterdam (1980)

  7. G.R.Hanson, B.M.Siegel: J. Vac. Sci. Technol.16, 1875 (1979)

    Google Scholar 

  8. R.Clampitt, D.K.Jefferies: Inst. Phys. Conf. Series No. 38, p. 12 ed. by K.G.Stephens, I.H.Wilson, and J.L.Moruzzi (1979)

  9. G.Stengel, R.Kaitna, H.Löschner, P.WoIf, R.Sacher: J. Vac. Sci. Technol.16, 1883 (1979)

    Google Scholar 

  10. J.L.Bartelt, C.W.Slayman, J.E.Wood, J.Y.Chen, C.M.McKenna, C.P.Minning, J.F.Coakley, R.E.Holman, C.M.Perygo: J. Vac. Sci. Technol.19, 1166 (1981)

    Google Scholar 

  11. L.Csepregi, F.Iberl, P.Eichinger: Microcircuit Engineering, Amsterdam (1980)

  12. E.Munro: InAdvances in Electronics and Electron Physics, Supplement 13 B, ed. by A.Septier (Academic Press, New York 1980) p. 74

    Google Scholar 

  13. H.C.Pfeiffer: J. Vac. Sci. Technol.15, 887 (1978)

    Google Scholar 

  14. D.F.Kyser, R.Pyle: IBM J. Res. Dev.24, 426 (1980)

    Google Scholar 

  15. K.Karapiperis, L.Adesida, S.A.Lee, E.D.Wolf: J. Vac. Sci. Technol.19, 1259 (1981)

    Google Scholar 

  16. H.Ryssel, K.Haberger: Microcircuit Engineering, Lausanne (1981)

  17. M.Abramowitz, I.A.Segun:Handbook of Mathematical Tables (Dover Publications, New York 1964)

    Google Scholar 

  18. M.P.Lepselter, W.T.Lynch: InVLSI Electronics Microstructure Science, Vol. 1, by N.G.Einspruch (Academic Press, New York 1981)

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Fraunhofer-Institut für Festkörpertechnologie, Paul-Gerhardt-Allee 42, D-8000, München 60, Fed. Rep. Germany

    H. Ryssel, G. Prinke, H. Bernt, K. Haberger & K. Hoffmann

Authors
  1. H. Ryssel
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. G. Prinke
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. H. Bernt
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. K. Haberger
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. K. Hoffmann
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Ryssel, H., Prinke, G., Bernt, H. et al. Ion beam exposure of resists. Appl. Phys. A 27, 239–241 (1982). https://doi.org/10.1007/BF00619085

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00619085

PACS

Search

Navigation