Abstract
The nonlinear balance equation, describing the evolution of concentration profiles for a multicomponent target under the action of ion bombardment as a function of the depth inside the target and the incident ion fluence, was solved numerically. The quantities of interest have been calculated with reference to a binary system showing that the balance equation is consistent with the correct stoichiometry for the sputtering yield ratio in the stationary state.
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The computer code is written in FORTRAN and is still in expansion in order to provide other kinds of calculations; in the present form the output furnishes for each material the concentration profile as a function of the incident ion fluence and of the depth inside the target. A note on the final version of the code will be published probably under the form of internal report
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Falcone, G., Oliva, A. Sputtering of multicomponent materials. Appl. Phys. A 33, 175–178 (1984). https://doi.org/10.1007/BF00618751
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DOI: https://doi.org/10.1007/BF00618751