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Al reaction with SiO2 an auger electron spectroscopy and energy loss spectroscopy study

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Abstract

Evidence for a reaction between aluminium and SiO2 film is presented using Auger electron spectroscopy (AES) and low-energy electron-loss spectroscopy (ELS) techniques. This reaction is studied “in situ” during the manufacture of metal insulator semiconductor devices (MIS), under ultra-high vacuum conditions (UHV). A reduction of the SiO2 film upon aluminization occurs, even at room temperature, giving rise to a complex interface.

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References

  1. M. Commandré, J. Derrien, A. Cros, F. Salvan, G. Sarrabayrouse, J. Buxo: InInsulating Films on Semiconductors, ed. by M. Schulz and G. Pensl, Springer Ser. Electrophys.7 (Springer, Berlin, Heidelberg, New York 1981) p. 68

    Google Scholar 

  2. J. Derrien, M. Commandré: Surf. Sci.118, (1982) (in press)

  3. M. Commandré: Thesis, University Lyon (1981)

  4. Y.E. Strausser, K.S. Majumder: J. Vac. Sci. Technol.15, 238 (1978)

    Google Scholar 

  5. Y.E. Strausser, E.J. Scheibner, J.B. Johannessen: Thin Solid Films52, 203 (1978)

    Google Scholar 

  6. R.S. Bauer, R.Z. Bachrach, L.J. Brillson: Appl. Phys. Lett.37, 1006 (1980)

    Google Scholar 

  7. S. Roberts, P.J. Dobson: J. Phys. D (Appl. Phys.)14, L17 (1981)

    Google Scholar 

  8. L.G. Olsen, D.L. Barton, W. Miller, J.E. Garnier, R.P. Turcotte: J. Appl. Phys.51, 6393 (1980)

    Google Scholar 

  9. N. Lieske, R. Hezel: Thin Solid Films61, 217 (1979)

    Google Scholar 

  10. R. Ludeke, A. Koma: Phys. Rev. Lett.34, 1170 (1975)

    Google Scholar 

  11. H. Ibach, J.E. Rowe: Phys. Rev. B9, 1951 (1974)

    Google Scholar 

  12. A. Cros, J. Derrien, F. Salvan: Surf. Sci.110, 352 (1981)

    Google Scholar 

  13. F. Pellerin, C. Legressus, D. Massignon: Surf. Sci.103, 510 (1981) and reference therein

    Google Scholar 

  14. J. Olivier, R. Poirier: Surf. Sci.105, 347 (1981) and reference therein

    Google Scholar 

  15. N. Lieske, R. Hezel: J. Appl. Phys.52, 5806 (1981)

    Google Scholar 

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Author notes

  1. J. Derrien

    Present address: I.S.E.A., Université de Haute Alsace, 4, rue des Frères Lumière, F-68093, Mulhouse Cédex, France

Authors and Affiliations

  1. Faculté des Sciences de Luminy, Départment de Physique, Case 901, F-13288, Marseille Cédex 9, France

    J. Derrien, M. Commandré, J. M. Layet, F. Salvan & A. Cros

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  1. J. Derrien
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  2. M. Commandré
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  3. J. M. Layet
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  4. F. Salvan
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  5. A. Cros
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Additional information

ERA CNRS n° 899

ERA CNRS n° 373

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Derrien, J., Commandré, M., Layet, J.M. et al. Al reaction with SiO2 an auger electron spectroscopy and energy loss spectroscopy study. Appl. Phys. A 28, 247–250 (1982). https://doi.org/10.1007/BF00618702

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  • DOI: https://doi.org/10.1007/BF00618702

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