Journal of Superconductivity

, Volume 6, Issue 1, pp 1–17 | Cite as

Thin-film processing of high-Tc superconductors

  • C. H. Stoessel
  • R. F. Bunshah
  • S. Prakash
  • H. R. Fetterman
Review Article

Abstract

This review of high-Tc superconducting thin-film processing focuses on the developments in thin-film deposition technologies since 1987. The common deposition processes are described with reference to their effects on superconductor film performance. A comparative evaluation of the potential of the technologies is also given. The development of multilayers and heterostructures is an important requirement for future device applications and is also described. The latest results of the deposition of novel superconducting materials and deposition on uncommon substrates are discussed. The outlook on some imminent topics of future development in process technologies for high-Tc superconducting thin films is discussed.

Key words

Superconductors thin films thin-film processing thin-film deposition sputtering coevaporation activated reactive evaporation molecular beam epitaxy laser ablation CVD MO-CVD PA-CVD multilayers heterostructures 

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Copyright information

© Plenum Publishing Corporation 1993

Authors and Affiliations

  • C. H. Stoessel
    • 1
  • R. F. Bunshah
    • 1
  • S. Prakash
    • 1
  • H. R. Fetterman
    • 2
  1. 1.Department of Materials Science and EngineeringUniversity of California-Los AngelesLos Angeles
  2. 2.Department of Electrical EngineeringUniversity of California-Los AngelesLos Angeles

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