Journal of Superconductivity

, Volume 2, Issue 2, pp 293–304 | Cite as

CO2 laser annealing of plasma-deposited high-T c superconducting thick films

  • Usha Varshney
  • R. J. Churchill
  • H. P. Groger
  • A. I. Kingon


Recent advances in the fabrication of high-T c superconducting thick films demand processing techniques which can eliminate film/substrate interdifiusion that occurs during subsequent post-annealing heat treatment after the film is deposited, thereby limiting the application of the thick films for devices. The present study evaluates laser annealing techniques for plasma-deposited Y-Ba-Cu-O thick films using a high-energy CO2 laser (10.6Μm) in a continuous wave mode. The results are compared with those obtained by conventional furnace annealing techniques necessary for post-heat treatment of as-deposited superconducting thick films. The high-T c superconducting phase is recovered by cationic diffusion during subsequent post-annealing heat treatment. Crystallographic phases and microstructural characterization have been performed using XRD, SEM, and EPMA analytical techniques. The significance of the technology lies in the elimination of film/substrate interdiffusion problems, thereby resulting in high-quality superconducting thick films. The technology will significantly reduce the post-annealing times usually required by conventional furnace annealing techniques.

Key words

laser annealing Y-Ba-Cu-O plasma spray thick films superconductivity 


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Copyright information

© Plenum Publishing Corporation 1989

Authors and Affiliations

  • Usha Varshney
    • 1
  • R. J. Churchill
    • 1
  • H. P. Groger
    • 1
  • A. I. Kingon
    • 2
  1. 1.American Research Corporation of VirginiaRadford
  2. 2.Department of Materials Science and EngineeringNorth Carolina State UniversityRaleigh

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