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Applied Physics A

, Volume 33, Issue 2, pp 77–82 | Cite as

Ion-beam mixing kinetics of Fe-Al multilayers studied by in situ electrical resistivity measurements

  • J. P. Rivière
  • J. Delafond
  • C. Jaouen
  • A. Bellara
  • J. F. Dinhut
Contributed Papers

Abstract

The ion-beam mixing of Fe-Al evaporated multiple-layer films has been investigated by measuring continuously the electrical resistivity of the samples during the bombardment. The experimental curves exhibit a tendency toward a saturation process and allow the determination of the critical dose corresponding to the total mixing of the multiple-layer film. The variations of the volume fraction of intermixed atoms as a function of the ion dose have been deduced and a semi-empirical model is proposed to explain the observed kinetics.

PACS

61.80 72.15 73.60 

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Copyright information

© Springer-Verlag 1984

Authors and Affiliations

  • J. P. Rivière
    • 1
  • J. Delafond
    • 1
  • C. Jaouen
    • 1
  • A. Bellara
    • 1
  • J. F. Dinhut
    • 1
  1. 1.Laboratoire de Métallurgie PhysiqueL.A. 131 C.N.R.S.PoitiersFrance

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