Applied Physics A

, Volume 39, Issue 4, pp 273–276 | Cite as

Reduction of the threshold temperature sensitivity of 1.55 μm InGaAsP lasers by subnanosecond optical excitation

  • H. J. Eichler
Contributed Papers


In GaAsP lasers operating at 1.5 to 1.6 μm were pumped optically with a pulsed 1.06 μm source. The temperature dependence of the pump energy at laser threshold has been measured for temperatures from 170 to 330 K. Pump pulse widths of 300 ns and 150–300 ps were employed, long and short compared to the carrier life-time in the laser material. Over the high-temperature range of 260 to 330 K short pulse excitation gives a considerable reduction of the threshold temperature sensitivity with a characteristic temperatureT 0 =85 K compared to T 0 h =45 K for long-pulse excitation. This is in qualitative agreement with previous results on electrically excited lasers although the temperature sensitivity of the optically excited lasers is larger. At temperatures between 170 to 260 K no reduction of the temperature sensitivity was observed.


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  1. 1.
    A.R. Adams, M. Asada, Y. Suematsu, S. Arai: Jpn. J. Appl. Phys.19, L621 (1980)Google Scholar
  2. 2.
    N.K. Dutta, R.J. Nelson: Appl. Phys. Lett.38, 407 (1981); J. Appl. Phys.53, 74 (1982)Google Scholar
  3. 3.
    M. Asada, A.R. Adams, K.E. Stubkjaer, Y. Suematsu, Y. Itaya, S. Arai: IEEE J. QE-17, 611 (1981)Google Scholar
  4. 4.
    M. Asada, Y. Suematsu: IEEE J. QE-19, 917 (1983)Google Scholar
  5. 5.
    N.K. Dutta, N.A. Olsson, J.P. Heritage, P.L. Liu: Appl. Phys. Lett.44, 943 (1984)Google Scholar
  6. 6.
    O.E. Martinez, J.P. Heritage, B.I. Miller, N.K. Dutta, R.J. Nelson: Appl. Phys. Lett.44, 5 (1984)Google Scholar
  7. 7.
    Pao-Lo Liu, J.P. Heritage, O.E. Martinez: Appl. Phys. Lett.44, 370 (1984)Google Scholar
  8. 8.
    HJ. Eichler, J. Krausser: Opt. Commun.52, 129 (1984)Google Scholar
  9. 9.
    K. Stubkjaer, M. Asada, S. Arai, Y. Suematsu: Jpn. J. Appl. Phys.20, 1499 (1981)Google Scholar
  10. 10.
    A. Haug: IEEE J. QE-21, 716 (1985) W. Bardyszewski, D. Yevick: J. Appl. Phys.58, 2713 (1985) and references given thereGoogle Scholar

Copyright information

© Springer-Verlag 1986

Authors and Affiliations

  • H. J. Eichler
    • 1
  1. 1.Optisches InstitutTechnische UniversitätBerlin 12

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