Abstract
Time-resolved mass spectrometry is used to study the desorbed species due to laser-induced etching of a solid CuCl and a chlorinated Cu surface. The observed desorption threshold, mass distribution and kinetic energies of the desorbed atoms and molecules at 355 and 532 nm radiation show that the laser-induced etching process is not simply thermal evaporation. It is suggested that competing nonthermal mechanisms due to electronic excitations may be very important in laser-induced desorption and etching. These processes are different for a solid CuCl and a chlorinated Cu surface. For laser-induced etching of Cu surfaces, chlorination of Cu is essential; however, formation of stoichiometric CuCl is not necessary. Excess Cu in the surface layer is responsible for the observed different etching behavior of a chlorinated Cu and a solid CuCl surface. The effect of laser radiation on these surfaces and possible etching mechanisms are discussed based on the experimental observations.
Similar content being viewed by others
References
See the reviews: T.J. Chuang; J. Vac. Sci. Technol.21, 798 (1982)
T.J. Chuang: Mat. Res. Soc. Symp. Proc.17, 45 (1983) and29, 185 (1984)
T.J. Chuang: Surf. Sci. Repts.3, 1 (1983)
D.J. Ehrlich, J.Y. Tsao: J. Vac. Sci. Technol. B1, 969 (1983)
T.J. Chuang, I. Hussia, W. Sesselmann: InLaser Processing and Diagnostics, ed. by D. Bäuerle, Springer Ser. Chem. Phys.39 (Springer, Berlin, Heidelberg 1984) p. 300
W. Sesselmann, T.J. Chuang: Surf. Sci.162, 1007 (1985)
W. Sesselmann, T.J. Chuang: J. Vac. Sci. Technol. B3, 1507 (1985)
G.L. Loper, M.D. Tabat: SPIE459, 121 (1984); Appl. Phys. Lett.46, 654 (1985)
T.J. Chuang: J. Vac. Sci. Technol.18, 638 (1981)
T.J. Chuang: IBM J. Res. Develop.26, 145 (1982)
W. Sesselmann, T.J. Chuang: Surf. Sci. (1986, in press)
See, e.g., G. Wedler, H. Ruhmann: Surf. Sci.121, 464 (1982)
J.F. Ready:Effects of High-Power Laser Radiation (Academic, New York 1971) p. 72
N. Bloembergen: InLaser-Solid Interactions and Laser Processing, ed. by S.D. Ferris, H. J. Leamy, and J. M. Poate (American Institute of Physics, New York 1979) p. 1
H.M. Rosenstock, J.R. Sites, J.R. Walton, R. Baldock: J. Chem. Phys.23, 2442 (1955)
M. Guido, G. Gigli, G. Balducci: J. Chem. Phys.57, 3731 (1972)
L.C. Wagner: thesis, Purdue University, Lafayette, Indiana (1974)
H.F. Winters: J. Vac. Sci. Technol. B3, 9 (1985), and A3, 786 (1985)
G. Krabbes, H. Oppermann: Z. Anorg. Allg. Chem.435, 33 (1977)
L. Brewer, J.J. Kane: J. Phys. Chem.59, 105 (1955)
J.E. Rothenberg, G. Koren, J.J. Ritsko: J. Appl. Phys.57, 5072 (1985)
J.E. Rothenberg, R. Kelly: Nucl. Instr. Methods Phys. Res. B1, 291 (1984)
J.P. Long, R.T. Williams, T.R. Royt, J.C. Rife, M.N. Kabler: Mat. Res. Soc. Symp. Proc.13, 89 (1983)
See, e.g., P.C. Townsend: InSputtering in Particle Bombardment II, ed. by R. Behrisch, Topics Appl. Phys.52 (Springer, Berlin, Heidelberg 1983) p. 147
N. Itoh, T. Nakayama: Phys. Lett.92A, 471 (1982)
T. Nakayama, M. Okigawa, N. Itoh: Nucl. Instr. Methods Phys. Res. B1, 301 (1984)
A. Bivas, C. Marange, J.B. Cirun, C. Schwab: Opt. Commun.6, 142 (1972)
S. Thomas, E. Mohler, F. Keilmann, L. Gensei: Appl. Phys. A33, 247 (1984)
M. Cardona: Phys. Rev.129, 69 (1963)
I. Hussla, R. Viswanathan: Surf. Sci.144 (1984)
See, e.g., C. Kittel:Introduction of Solid State Physics (Wiley, New York 1973)
M. Guido, G. Balducci, G. Gigli, M. Spoliti: J. Chem. Phys.55, 4566 (1971)
R.A.J Shelton: Trans. Far. Soc.57, 2113 (1961)
D. Menzel, R. Gomer: J. Chem. Phys.41, 3311 (1964)
P.A. Redhead: Can. J. Phys.42, 886 (1964)
See, e.g., D. Menzel: J. Vac. Sci. Technol.20, 538 (1982)
B.J. Garrison, R. Srinivasan: J. Appl. Phys.57, 2909 (1985)
M.L. Knotek, P.J. Feibelman: Phys. Rev. Lett.40, 964 (1978); also, Phys. Rev. B18, 6531 (1978)
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Sesselmann, W., Marinero, E.E. & Chuang, T.J. Laser-induced desorption and etching processes on chlorinated Cu and solid CuCl surfaces. Appl. Phys. A 41, 209–221 (1986). https://doi.org/10.1007/BF00616842
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00616842