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Spectral investigation of the plasma-chemical etching of silicon dioxide

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Literature cited

  1. A. Jackob, Solid State Technol.,19, No. 9, 70 (1976).

    Google Scholar 

  2. Y. Horiike and M. Shibagaki, Jpn. J. Appl. Phys.,15, No. 1, 13 (1976).

    Google Scholar 

  3. W. R. Harshlarger, R. A. Porter, T. A. Miller, and P. Norton, Appl. Spectrosc.,31, No. 3, 201 (1977).

    Google Scholar 

  4. A. R. Striganov and N. S. Sventitskii, Tables of Spectral Lines of Neutral and Ionized Atoms [in Russian], Atomizdat, Moscow (1966).

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  5. R. Pearse and A. Gaydon, The Identification of Molecular Spectra, London (1950).

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Authors
  1. M. N. Bosyakov
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  2. N. N. Nikiforenko
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  3. A. A. Labuda
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Additional information

Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 30, No. 4, pp. 622–624, April, 1979.

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Bosyakov, M.N., Nikiforenko, N.N. & Labuda, A.A. Spectral investigation of the plasma-chemical etching of silicon dioxide. J Appl Spectrosc 30, 434–436 (1979). https://doi.org/10.1007/BF00616172

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  • DOI: https://doi.org/10.1007/BF00616172

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