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Amorphous silicon diodes and TFTs for active matrix flat panel display applications

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Abstract

The use of a-Si devices (diodes and transistors) in active matrix flat-panel displays is reviewed. The fabrication of the elements and their characteristics with steady and pulsed applied potentials are discussed. Two experimental arrays of 32×32 BBDs and 256×320 TFTs are shown.

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Part of this work is supported by CEE under Esprit program No. 833

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Magariño, J. Amorphous silicon diodes and TFTs for active matrix flat panel display applications. Appl. Phys. A 41, 297–303 (1986). https://doi.org/10.1007/BF00616052

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  • DOI: https://doi.org/10.1007/BF00616052

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