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Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, 223, Yokohama, Japan

    M. -Y. Kang, T. Yamamoto, T. Matsui & T. Kuwano

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  1. M. -Y. Kang
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  2. T. Yamamoto
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  3. T. Matsui
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  4. T. Kuwano
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Kang, M.Y., Yamamoto, T., Matsui, T. et al. Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation. J Mater Sci Lett 15, 343–344 (1996). https://doi.org/10.1007/BF00591657

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  • DOI: https://doi.org/10.1007/BF00591657

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