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Chemical etching of berlinite in sulphuric acid solutions

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Abstract

The aim of this work is to chemically etch AT wafers of berlinite AIPO4 in sulphuric acid solutions in order to reach a thickness previously chosen (manufacturing of high frequency plate resonators). The kinetics of etching is studied: the decrease of thickness is followed by frequency measurement. The influence of temperature and acid concentration is measured and the evolution of surface texture is checked both by roughness measurements, resonance frequency and scanning electron microscopy methods.

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Authors and Affiliations

  1. USTL Laboratoire de Physicochimie des matériaux, URA D 0407, Place Eugène Bataillon, 34060, Montpellier Cedex, France

    O. Cambon, A. Goiffon & E. Philippot

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  1. O. Cambon
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  2. A. Goiffon
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  3. E. Philippot
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Cambon, O., Goiffon, A. & Philippot, E. Chemical etching of berlinite in sulphuric acid solutions. J Mater Sci 26, 846–851 (1991). https://doi.org/10.1007/BF00588326

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