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Journal of Materials Science

, Volume 25, Issue 6, pp 2822–2826 | Cite as

Residual stress gradients along ion implanted zones — cubic crystals

  • Satish I. Rao
  • C. R. Houska
Article

Abstract

Large internal strains and stresses can be produced by low temperature implantation over small distances from the free surface in a thick substrate. These are typically non-uniform and have large composition gradients. In dilute bcc solutions, containing unclustered interstitial implants, the residual macroscopic strains may be treated as isotropic. The calculation of residual strain (or stress) is based upon anisotropic elasticity theory and internal stress is given in terms of the dipole tensor for individual defects in single crystal films. In a completely elastic zone, forces act to maintain a rigid outside surface and cause the strain distribution to be zero along directions parallel to the free surface. This produces a strain magnification along the perpendicular direction from Poisson contractions. If the implanted zone is completely relaxed by plastic deformation, the strains are described by the free expansion strains due to both implants and lattice damage. There is no angular dependence of the free expansion strain in this extreme condition. One can determine whether a zone is completely elastic, completely relaxed by plastic deformation, or in some intermediate state from plots of strain against sin2χ, where χ is the angle of tilt relative to the surface normal. These results may be obtained from X-ray Bragg intensity data by measuring shifts and line broadening from (hkl) planes at different tilt angles. Theoretical results are given for both single crystal and polycrystalline materials in terms of residual strain and stress.

Keywords

Residual Stress Residual Strain Anisotropic Elasticity Macroscopic Strain Crystal Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman and Hall Ltd 1990

Authors and Affiliations

  • Satish I. Rao
    • 1
  • C. R. Houska
    • 1
  1. 1.Virginia Polytechnic Institute and State UniversityBlacksburgUSA

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