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Chemical vapour deposition of thin copper films using a new metalorganic precursor

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Materials Research Centre and Department of Organic Chemistry, Indian Institute of Science, 560012, Bangalore, India

    S. Chandrasekaran

  2. Indian Institute of Science, 560012, Bangalore, India

    J. Goswami, L. Raghunathan, A. Devi & S. A. Shivashankar

Authors
  1. J. Goswami
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  2. L. Raghunathan
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  3. A. Devi
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  4. S. A. Shivashankar
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  5. S. Chandrasekaran
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Goswami, J., Raghunathan, L., Devi, A. et al. Chemical vapour deposition of thin copper films using a new metalorganic precursor. J Mater Sci Lett 15, 573–575 (1996). https://doi.org/10.1007/BF00579254

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  • DOI: https://doi.org/10.1007/BF00579254

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