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Quantitative depth profiling with AES: application to oxide layers of NiCrFe alloys

  • J. Steffen
  • S. Hofmann
Article

Keywords

Oxide Physical Chemistry Analytical Chemistry Inorganic Chemistry Oxide Layer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Quantitative Tiefenprofilermittlung mit AES: Anwendung auf Oxidschichten an NiCrFe-Legierungen

References

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    Seah MP, Sanz JM, Hofmann S (1981) Thin Solid Films 81:239–246Google Scholar
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    Hofmann S, Sanz JM (1984) Surf Interface Anal 6:78–81Google Scholar
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    Steffen J, Hofmann S (1988) Surf Interface Anal 11:617–626Google Scholar
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    Steffen J, Hofmann S (1987) Fresenius Z Anal Chem 329:250–255Google Scholar
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    Hofmann S (1986) Surf Interface Anal 9:3–20Google Scholar
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    Steffen J, Hofmann S, to be publishedGoogle Scholar
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    Hofmann S, Steffen J (1988) Paper pesented at Symposium on Applied Surface Analysis; 27–29 April 1988, Denver, USA; to be published in Surf Interface AnalGoogle Scholar

Copyright information

© Springer-Verlag 1989

Authors and Affiliations

  • J. Steffen
    • 1
  • S. Hofmann
    • 1
  1. 1.Institut für WerkstoffwissenschaftMax-Planck-Institut für MetallforschungStuttgart 1Federal Republic of Germany

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