Quantitative depth profiling with AES: application to oxide layers of NiCrFe alloys

  • J. Steffen
  • S. Hofmann


Oxide Physical Chemistry Analytical Chemistry Inorganic Chemistry Oxide Layer 
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Quantitative Tiefenprofilermittlung mit AES: Anwendung auf Oxidschichten an NiCrFe-Legierungen


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Copyright information

© Springer-Verlag 1989

Authors and Affiliations

  • J. Steffen
    • 1
  • S. Hofmann
    • 1
  1. 1.Institut für WerkstoffwissenschaftMax-Planck-Institut für MetallforschungStuttgart 1Federal Republic of Germany

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