Journal of Materials Science

, Volume 28, Issue 19, pp 5345–5348 | Cite as

Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate

  • T. Maruyama
  • T. Tago
Papers

Abstract

Nickel thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was nickel acetylacetonate. At a reaction temperature above 250 °C, polycrystalline nickel films can be obtained by hydrogen reduction of the raw material. The resistivity (8.1–13.3 μΩ cm) of the film was close to that of bulk nickel.

Keywords

Hydrogen Polymer Nickel Thin Film Reaction Temperature 

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References

  1. 1.
    Editorial Staff,Chem. Eng. 56 (10) (1949) 118.Google Scholar
  2. 2.
    D. Peterson, “Non-Vacuum Deposition Techniques for Use in Fabricating Thin Film Circuits”, No. NObsr 91336, Final Report 1967.Google Scholar
  3. 3.
    V. G. Syrkin andYu. G. Kiryanov,J. Appl. Chem. USSR 43 (1970) 1076.Google Scholar
  4. 4.
    M. Skibo andF. A. Greulich,Thin Solid Films 113 (1984) 225.Google Scholar
  5. 5.
    R. L. Van Hemert, L. B. Spendlove andR. E. Sievers,J. Electrochem. Soc. 112 (1965) 1123.Google Scholar
  6. 6.
    C. H. J. Van Den Brekel, R. M. M. Fonville, P. J. M. Van Der Straten andG. Verspui, in Proceedings of 8th International Conference on Chemical Vapor Deposition, edited by J. M. Blocher Jr, G. E. Vuillard and G. Wahl, Pennington, NJ (Electrochemical Society, Pennington, NJ, 1981) p. 142.Google Scholar

Copyright information

© Chapman & Hall 1993

Authors and Affiliations

  • T. Maruyama
    • 1
  • T. Tago
    • 1
  1. 1.Department of Chemical Engineering, Faculty of EngineeringKyoto UniversityKyotoJapan

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