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Plasma Chemistry and Plasma Processing

, Volume 5, Issue 1, pp 89–89 | Cite as

Mass spectrometer-wall probe diagnostic of Ar discharges containing SF6 and/or O2: Reactive Ions in Etching Plasmas

  • H. G. Lergon
  • M. Venugopalan
  • K. G. Müller
Errata
  • 160 Downloads

Copyright information

© Plenum Publishing Corporation 1985

Authors and Affiliations

  • H. G. Lergon
  • M. Venugopalan
  • K. G. Müller

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