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Time and temperature dependent breakdown characteristics of ZnS:Mn films obtained by rf-magnetron sputtering

  • Semiconductor And Insulator Physics
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Abstract

Breakdown delay times (tdel) for films of managanese-doped zinc sulfide (ZnS:Mn) were measured in the range 10−6−10−1 s. The maximum value was tdel=10−3−10−2 s. The electrical strength (Ebr) was found to increase as the voltage pulse duration was reduced, the more so the thinner the ZnS:Mn film. The temperature dependence of Ebr exhibited a weak reduction in Ebr as the temperature was raised to roughly 80°C and a sharp reduction in Ebr for T>130°C. A maximum in Ebr was observed at T≈130°C which is presumably explained by a structural modification of the ZnS:Mn film. The experimental results obtained are explained in terms of a combined electronic and thermal breakdown mechanism.

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References

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State Academy of Control Systems and Radioelectronics, Tomsk. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 4, pp. 3–6, April, 1994.

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Zhigal'skii, A.A., Mukhachev, V.A. & Troyan, P.E. Time and temperature dependent breakdown characteristics of ZnS:Mn films obtained by rf-magnetron sputtering. Russ Phys J 37, 309–311 (1994). https://doi.org/10.1007/BF00560209

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  • DOI: https://doi.org/10.1007/BF00560209

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