Abstract
It is shown theoretically and by experiment that dual exposure recording of Gabor holograms of an amplitude scattering mask leads to twice the normal sensitivity for the same amount of shift in a lateral shear interferometer of axial wavefront aberrations of a controllable wavefront.
This is a preview of subscription content, log in via an institution to check access.
Access this article
We’re sorry, something doesn't seem to be working properly.
Please try refreshing the page. If that doesn't work, please contact support so we can address the problem.
Similar content being viewed by others
References
V. G. Gusev, Elektr. Tekh., Ser. 11., Laser. Tekh. Optoelektr., No. 4, 63–67 (1990).
V. G. Gusev, Optika Spektrosk.,69, No. 4, 914–917 (1990).
V. G. Gusev, Izv. Vyzov. Fizika, No. 8, 106–111 (1994).
M. Born and E. Wolf, Principles of Optics, 5th Ed., Pergamon Press, Oxford (1975).
V. G. Gusev, Opt. Atmos. Okeana,5, No. 2, 115–124 (1992).
R. Jones and C. Wykes, Holographic and Speckle Interferometry, Cambridge U. Press, Cambridge (1989).
M. Francon, Laser Speckle and Applications in Optics, translated by H. H. Arsenault, Academic Press, New York (1979).
V. G. Gusev, Elektr. Tekh. Ser. 11, Laser. Tekh. Optoelektr., No. 3, 55–56 (1991).
Additional information
Tomsk University. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 89–94, October, 1995.
Rights and permissions
About this article
Cite this article
Gusev, V.G. Registration of lateral shear interferograms for the case of dual exposure recording of Gabor holograms. Russ Phys J 38, 1081–1085 (1995). https://doi.org/10.1007/BF00559048
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF00559048