Abstract
The composite layers of titanium and its high-melting compounds (TiN x , TiN x C y ) were crystallized from the pulse plasma on steel at a temperature ⩽500 K. It was found that the electrode tip was a source of the composite metallic part and that the electrode lateral surfaces covered by titanium compounds yielded vapours of the elements being components of the compound. These vapours were the source of the second composite part. Considering that the type of crystallized layer is determined by temperature and pressure in the nucleation region, one can assume that the TiN nucleation takes place in this very plasma, in the temperature range 1800 to 2700 K.
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Michalski, A., Sokołowska, A. The formation of the high-melting TiN-Ti composites in the pulse plasma. J Mater Sci 20, 1842–1846 (1985). https://doi.org/10.1007/BF00555292
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DOI: https://doi.org/10.1007/BF00555292