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Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection

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Abstract

The titanium nitride coating film was prepared on the SiO2 glass substrate by ammonolysis of titanium dioxide coating film formed by sol-gel method. The X-ray diffraction (XRD) pattern indicated that it is cubic titanium nitride with a lattice parameter,a o, of 0.4231 nm. The obtained titanium nitride is non-stoichiometric (TiN x x≤ 1) because the value, 0.4231 nm, is smaller than the stoichiometric one (0.4240 nm). The coating film show very high infrared (i.r.) reflectance in the wavelength region of 2–8 μm.

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Authors and Affiliations

  1. Development Department 6, Matsushita-Kotobuki Electronics Industries Ltd, 2419, Utazu, Ayauta, 769-02, Kagawa, Japan

    Kazushige Kohno

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  1. Kazushige Kohno
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Kohno, K. Nitridation of the sol-gel derived TiO2 coating films and the infrared ray reflection. J Mater Sci 27, 658–660 (1992). https://doi.org/10.1007/BF00554032

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  • DOI: https://doi.org/10.1007/BF00554032

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