Resistivity and temperature coefficient of resistance of chromium-copper alloy films
Measurements of electrical resistivity and the temperature coefficient of resistance of vacuum deposited chromium—copper alloy films are reported. The mean freepath of the conduction electrons calculated from resistivity data and TCR data is 37.6 and 36.3 nm, respectively. The resistivity and TCR of an infinitely thick film have been computed to be 3.83 μΩcm and 2.886 × 10−3° C−1, respectively. The experimental data can be satisfactorily explained on the basis of Fuchs-Sondheimer theory assuming a total diffuse scattering.
KeywordsPolymer Copper Experimental Data Chromium Electrical Resistivity
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- 1.M. A. Hunter andF. M. Sebas,J. Amer. Inst. Met. 11 (1971) 115.Google Scholar
- 2.W. R. Hibbard, F. D. Rosi, H. T. Clark andR. I. O'herron,Trans. Amer. Inst. Metall. Eng. 175 (1948) 283.Google Scholar
- 3.I. Kovacs andG. Szenes,Phys. Status Solidi a5 (1971) 231.Google Scholar
- 4.J. J. O'neill Jr andJ. L. Vossen,J. Vac, Sci. Technol. 10 (1973) 533.Google Scholar
- 5.A. R. Patel, N. C. Pandya, N. C. Chourasia andG. K. Shivakumar,Ind. J. Pure Appl. Phys. 20 (1982) 100.Google Scholar
- 6.A. R. Patel, N. C. Pandya, N. C. Chourasia andG. K. Shivakumar,Phys. Status Solidi (a) 71 (1982) 323.Google Scholar
- 7.D. C. Larson, in “Physics of Thin Films” Vol. 6, edited by G. Mass and R. E. Thun (Academic Press, New York, 1971) p. 81.Google Scholar
- 8.K. L. Chopra, “Thin Film Phenomena” (McGraw-Hill, New York, 1969) p. 353.Google Scholar