Abstract
TiC x N y mono- and TiCx-TiN double-layer films with a thickness of 30 to 100 μm were prepared on a carbon steel (C: 0.6 to 0.7%) substrate by CVD in an ultrasonic field (ultrasound frequency: 19kHz; power: 10 to 20Wcm−2). The moderate deposition conditions for obtaining an adherent and thick film of TiC x N y were: substrate temperature: 1050° C; H2, N2, TiCl4 and CH4 flow rates: 6.2, 4.0, 0.9 and 0.26 to 2.0 ml sec−1, respectively. The growth rate, grain size and degree of 〈2 2 0〉 preferred orientation were found to decrease with increase in CH4 concentration. TiC x N y film on carbon steel had a Vickers microhardness of 1800 to 2600 and an adhesion strength to the substrate of more than 120 kg cm−2. A TiC x -TiN (x∼0.5) double-layer film was obtained at 1050° C by a controlled alternative deposition of TiC x or TiN. Quasiepitaxial growth of crystallites in the double layers was found to prevail in both coatings of TiC x (220)/TiN (220)/steel and TiN (200)/TiCx (200)/steel.
Similar content being viewed by others
References
T. Takahashi and H. Itoh, J. Electrochem. Soc. 124 (1977) 797.
L. Aggour, E. Fiter and W. Weisweiler, High Temp. High Pres. 6 (1974) 73.
G. Wakefield and J. Bloom, Proceedings of the 3rd International Conference on C.V.D. (1972) p. 397.
H. Pierson, Thin Solid Films 40 (1977) 41.
G. Wakefield, C. Yaws and J. Bloom, Proceedings of the 4th International Conference on C.V.D. (1973) pp. 173, 577.
J. Nickl, K. Schweitzer und A. Hahlweg, J. Less-Common Metals 51 (1977) 235.
W. Schintlmeister, O. Pacher, K. Pfaffinger and T. Raine, Proceedings of the 5th International Conference on C.V.D. (1975) p. 523.
P. Ehrlich, Z. Anorg. Allgem. Chem. 259 (1949) 1.
E. Storms, “The Refractory carbides” (Academic Press, New York, 1976) p. 1.
K. Hamamura, H. Yamagishi and S. Nagakura, J. Crystal Growth 26 (1974) 255.
L. Berry, B. Post, S. Weissmann and H. McMurdie, “Inorganic Index to the Powder Diffraction File” File No. 6-0642 and 6-0614 (Joint Committee on Powder Diffraction Standard, Easton, 1971).
P. Duwez and F. Odell, J. Electrochem. Soc. 97 (1950) 299.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Takahashi, T., Itoh, H. TiCxNy and TiCx-TiN films obtained by CVD in an ultrasonic field. J Mater Sci 14, 1285–1290 (1979). https://doi.org/10.1007/BF00549299
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00549299