Journal of Materials Science

, Volume 27, Issue 14, pp 3743–3748 | Cite as

Effect of additive-oxide amount on sintering of Si3N4 with Y2O3 and Nd2O3

  • Naoto Hirosaki
  • Akira Okada


The effect of additive amount on the gas-pressure sintering of silicon nitride is investigated. Silicon nitride containing 0.5 to 10 mol % (SN10) of equimolar Y2O3-Nd2O3 is fired at 1600 to 1900 °C for 4 h in 10 M Pa N2 gas. A small amount of oxide (1 mol %; SN1) is effective for densification as well as a larger amount of oxide (6–10 mol %) when fired at 1900 °C. Composition analysis of sintered specimens indicates that SN1 densifies through a small amount of SiO2-rich liquid-phase, whereas SN10 densifies by way of a large amount of additive-oxide-rich liquid phase.


Oxide Polymer Silicon Liquid Phase Nitride 
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Copyright information

© Chapman & Hall 1992

Authors and Affiliations

  • Naoto Hirosaki
    • 1
  • Akira Okada
    • 1
  1. 1.Central Engineering LaboratoriesNissan Motor Co. LtdYokosukaJapan

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