Abstract
Experimental data related to the variations with temperature in the film resistivity of amorphous nickel-boron layers (electrochemically deposited) and its temperature coefficient are used for identifying the temperature for the phase transition. Suggestions are presented for interpreting the observed shifts in the resistivity and in the product of resistivity and its temperature coefficient.
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Pichard, C.R., Bouhala, Z., Tosser, A.J. et al. A comparison of conductive and crystallographic effects of the phase transition in electrochemical nickel-boron layers. J Mater Sci 20, 3305–3310 (1985). https://doi.org/10.1007/BF00545199
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DOI: https://doi.org/10.1007/BF00545199