Abstract
The effect of substrate temperature, deposition rate and annealing on the electrical resistivity of thin yttrium films in the thickness range 10 to 80 nm is reported. The resistivity of films decreases at higher deposition rates and substrate temperatures. These experimental results are analysed using the Fuchs—Sondheimer and Mayadas—Shatzkes theories. The annealing behaviour of yttrium films is in agreement with the Vand theory.
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References
M. A. Angadi and P. V. Ashrit, Vacuum 31 (1981) 161.
Idem, Phys. Status Solidi (a) 67 (1981) K119.
Idem, Vacuum 32 (1982) 99.
Idem, J. Mater. Sci. 16 (1981) 3513.
Idem, Phys. Status Solidi (a) 77 (1983) in press.
Idem, Proceedings of the Solid State Physics Nuclear Physics Symposium organised by the department of Atomic Energy, Govt. of India at the Indian Institute of Technology, New Delhi, India, 23C, (1980).
Idem, J. Less-Common Met. 75 (1980) 147.
K. L. Chopra, “Thin Film Phenomena” (McGraw Hill, New York, 1969).
M. A. Angadi and P. V. Ashrit, Thin Solid Films 72 (1980) L5.
P. V. Ashrit, PhD thesis (unpublished) Karnatak University, India (1983).
D. Larson, “Physics of Thin Films” Vol. 6, edited by M. Francomb and R. W. Hoffman (Academic Press, New York, 1971) p. 65.
A. F. Mayadas and M. Shatzkes, Phys. Rev. B1 (1970) 1382.
L. A. Falkovsky, J. Expt. Theor. Phys. 64 (1973) 1855.
V. Vand, Proc. Phys. Soc. 55 (1943) 222.
S. M. Shivaprasad and M. A. Angadi, J. Phys. D (Appl. Phys.) 14 (1981) 1125.
S. M. Shivaprasad, PhD thesis (unpublished) Karnatak University Dharwad 580003, India (1982).
M. A. Angadi and L. A. Udachan, J. Mater. Sci. 16 (1981) 1412.
M. A. Angadi and P. V. Ashrit, Vacuum 31 (1981) 161.
Idem, ibid, submitted for publication.
A. Borodziuk-Kupla, B. Stolecki and C. Wesolowska, Thin Solid Films 85 (1981) 323.
B. Stolecki, A. Borodziuk-Kulpa and C. Wesolowska, ibid. 56 (1979) 299.
L. A. Udachan, S. M. Shivaprasad, P. V. Ashrit and M. A. Angadi, Phys. Status Solidi (a) 60 (1980) K191.
P. V. Ashrit and M. A. Angadi, ibid..
S. M. Shivaprasad and M. A. Angadi, J. Phys. D (Appl. Phys.) 13 (1980) L157.
M. A. Angadi and L. A. Udachan, Thin Solid Films 78 (1981) 299.
K. Narayandas, M. Radhakrishnan and C. Balasubramanian, ibid. 67 (1980) 357.
K. L. Chopra, R. Surri and A. P. Thakoor, J. Appl Phys. 48 (1977) 538.
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Angadi, M.A., Ashrit, P.V. The effect of substrate temperature, deposition rate and annealing on the electrical resistivity of thin yttrium films. J Mater Sci 18, 3177–3182 (1983). https://doi.org/10.1007/BF00544140
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DOI: https://doi.org/10.1007/BF00544140