Journal of Materials Science

, Volume 17, Issue 9, pp 2486–2494 | Cite as

Microstructures and subcritical crack growth in oxidized hot-pressed Si3N4

  • G. Das
  • M. G. Mendiratta
  • G. R. Cornish


The microstructure of the oxide scales, primarily the size, distribution, and density of the pits, was characterized in hot-pressed Si3N4 oxidized at different temperatures from 1300 to 1450‡ C. These microstructural features and the chemical changes in Si3N4 due to oxidation were related to the elevated-temperature subcritical crack-growth (SCG) behaviour. Oxidation at 1375‡ C for 240h resulted in a measurable improvement in SCG over that in as-hot-pressed and 1300‡ C-oxidized Si3N4.


Oxidation Polymer Microstructure Chemical Change Oxide Scale 
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Copyright information

© Chapman and Hall Ltd 1982

Authors and Affiliations

  • G. Das
    • 1
  • M. G. Mendiratta
    • 1
  • G. R. Cornish
    • 1
  1. 1.Systems Research Laboratories, Inc.DaytonUSA

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