Abstract
High-purity silicon powder compacts have been nitrided in nitrogen atmospheres containing varying partial pressures of hydrogen. The accelerated nitridation rates observed are interpreted in terms of the interaction of the hydrogen with the natural oxide film on the surface of the silicon particles. A model is presented for reactions taking place during the nitridation of these compacts in the presence of furnace atmospheres contaminated by low partial pressures of water vapour.
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Dervišbegović, H., Riley, F.L. The role of hydrogen in the nitridation of silicon powder compacts. J Mater Sci 16, 1945–1955 (1981). https://doi.org/10.1007/BF00540643
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DOI: https://doi.org/10.1007/BF00540643