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On the post-etching of diamond thin films in a hydrogen-oxygen atmosphere

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Journal of Materials Science Letters

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Xiling, P., Xiaolin, C. On the post-etching of diamond thin films in a hydrogen-oxygen atmosphere. J Mater Sci Lett 12, 687–689 (1993). https://doi.org/10.1007/BF00465593

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  • DOI: https://doi.org/10.1007/BF00465593

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