Skip to main content
Log in

Investigation of ripple defects on molecular beam epitaxy grown GaAs layers

  • Published:
Journal of Materials Science Letters

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

References

  1. A. E. Blakeslee, Trans. Metall. Soc. AIME 254 (1969) 577.

    Google Scholar 

  2. D. W. Shaw, J. Electrochem. Soc. 4 (1968) 405.

    Google Scholar 

  3. R. A. Stall, J. Zilco, V. Swaminathan and N. Schumaker, J. Vacuum Sci. Technol. 133 (1985) 524.

    Google Scholar 

  4. M. Ilegems, J. Appl. Phys. 48 (1977) 1278.

    Google Scholar 

  5. M. Mizuta, S. Kawata, T. Twamoto and H. Kukimoto, Jpn. J. Appl. Phys. 23 (1984) L283.

    Google Scholar 

  6. N. J. Kadhim, M. Mehta and D. Mukherjee, Vacuum 42 (1991) 503.

    Google Scholar 

  7. J. C. Bean, in “Impurity doping processes in silicon”, edited by F. Y. Wang (North-Holland, Amsterdam, 1981).

  8. N. J. Kadhim and D. Mukherjee, in “Proceedings of the 3rd European Conference on Crystal Growth (ECCG-3), Budapest, 5–11 May 1991 (1991) p. 428.

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Kadhim, N.J., Mukherjee, D. & Mehta, M. Investigation of ripple defects on molecular beam epitaxy grown GaAs layers. J Mater Sci Lett 12, 623–625 (1993). https://doi.org/10.1007/BF00465572

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00465572

Keywords

Navigation