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Some applications of activation analysis for the determination of trace impurities in semiconductor materials

Einige Anwendungen der Aktivierungsanalyse zur Bestimmung von Spurenverunreinigungen in Halbleiter-Materialien

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Zusammenfassung

Es wird gezeigt, daß die Aktivierungsanalyse mit gutem Erfolg zur Spurenbestimmung von Verunreinigungen in Halbleiter-Materialien herangezogen werden kann. Spezifität, Empfindlichkeit und Reproduzierbarkeit dieses Verfahrens werden diskutiert. Als Beispiel wird ein Überblick über die Bestimmung der Verunreinigungen in Germanium, Selen und Silicium gegeben.

Summary

It is shown that activation analysis can be applied with good success for the determination of trace impurities in semiconductor material. The specificity and sensitivity together with a reasonable reproducibility are demonstrated. As an example, a survey of the determinations carried out with Ge, Se and Si matrices is given.

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References

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Author information

Authors and Affiliations

  1. Laboratory of Analytical Chemistry of Ghent University, Belgium

    J. Hoste &  D. De Soete

  2. Faculteit der Wetenschappen, Inst. voor Nucl. Wetensch., Proeftuinstr., Gent, Belgium

    D. De Soete

Authors
  1. J. Hoste
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  2. D. De Soete
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Additional information

Communications given at the meeting “Analytisce Probleme der Reindarstellung von Halbleitern” 24–25 September 1986, Wiesbaden.

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Hoste, J., De Soete, D. Some applications of activation analysis for the determination of trace impurities in semiconductor materials. Z. Anal. Chem. 245, 221–232 (1969). https://doi.org/10.1007/BF00423675

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  • DOI: https://doi.org/10.1007/BF00423675

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