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Stress and strain relaxation behaviour in HIPed silicon nitrides

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Journal of Materials Science Letters

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Authors and Affiliations

  1. High Temperature Materials Laboratory, Oak Ridge National Laboratory, 37831-6064, Oak Ridge, TN, USA

    A. A. Wereszczak, T. P. Kirkland & M. K. Ferber

Authors
  1. A. A. Wereszczak
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  2. T. P. Kirkland
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  3. M. K. Ferber
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Wereszczak, A.A., Kirkland, T.P. & Ferber, M.K. Stress and strain relaxation behaviour in HIPed silicon nitrides. J Mater Sci Lett 13, 1469–1471 (1994). https://doi.org/10.1007/BF00419137

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  • DOI: https://doi.org/10.1007/BF00419137

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