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The morphological degradation mechanism of the TiSi2/Si structure

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Materials Engineering, Hanyang University, Seoul, Korea

    Y. S. Hwang, S. H. Paek & H. S. Kim

  2. Electron and Electric Division, Korea Institute of Industry Technology Information, Korea

    H. C. Cho

  3. R&D Department Kihung-eup, Samsung Electronics, Kyunki-do, Korea

    J. S. Choi, J. K. Jung, S. I. Lee & J. G. Lee

Authors
  1. Y. S. Hwang
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  2. S. H. Paek
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  3. H. S. Kim
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  4. H. C. Cho
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  5. J. S. Choi
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  6. J. K. Jung
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  7. S. I. Lee
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  8. J. G. Lee
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Hwang, Y.S., Paek, S.H., Kim, H.S. et al. The morphological degradation mechanism of the TiSi2/Si structure. J Mater Sci Lett 12, 1682–1683 (1993). https://doi.org/10.1007/BF00418830

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  • DOI: https://doi.org/10.1007/BF00418830

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