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Pulsed-laser deposition of selenium

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Abstract

The preparation and characterization of amorphous selenium thin films grown by pulsed-laser deposition (PLD) is presented. Two laser excitation regimes at 1064 and 532 nm were studied. Interesting relations between the surface quality and the different experimental parameters were found. High-purity thin films were produced with surface quality similar to that obtained by a thermal process. A study of the emission spectra of the plasma generated during ablation is included.

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Authors and Affiliations

  1. Departamento de Física, Laboratorio de Optica Cuántica, Universidad Autónoma Metropolitana-Iztapalapa, Ap. Post. 55-534, México 09340 D.F., Mexico

    M. Fernández-Guasti, E. Haro-Poniatowski & R. Diamant

  2. IMRE-Universidad de la Habana, Vedado 10400, La Habana, Cuba

    L. Ponce & E. Jiménez

Authors
  1. M. Fernández-Guasti
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  2. E. Haro-Poniatowski
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  3. R. Diamant
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  4. L. Ponce
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  5. E. Jiménez
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Fernández-Guasti, M., Haro-Poniatowski, E., Diamant, R. et al. Pulsed-laser deposition of selenium. Journal of Materials Science 30, 6253–6256 (1995). https://doi.org/10.1007/BF00369674

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  • DOI: https://doi.org/10.1007/BF00369674

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