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Reactive deposition of ultrafine cobalt powders

Part I Electrochemical investigation


During the reactive deposition of cobalt powders, Co(OH)2 colloidal layers are formed at the electrode surface; the individual cobalt crystals are isolated by the Co(OH)2 colloid around the grain boundaries so that their growth is inhibited and ultrafine cobalt crystal grains are formed, which are loosely attached to the titanium substrate. The existence of Co(OH)2 colloid layer at the electrode surface depresses the hydrogen evolution reaction in the deposition process and accelerates the decrease of the interfacial Co2+ concentration. Therefore, compared to the normal deposition of cobalt powders, it has several unique advantages: (1) ultrafine cobalt powders (0.4–0.6 μm) can be produced; (2) the amount of Co(OH)2 in the powders is decreased; (3) there is a wider range of current density for the formation of cobalt powders.

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  1. 1.

    J. L. Su, M-M. Chen, J. Lo and R. E. Lee, J. Appl. Phys. 63 (1988) 4022.

    Google Scholar 

  2. 2.

    H. F. Quinn and L. M. Croll, “Advances in X-ray Analysis” Vol. 4 (Plenum Press, New York, 1980). p. 151.

    Google Scholar 

  3. 3.

    The Cobalt Development Institute (CDI), Cobalt News 89/2 (London 1989) p. 2.

    Google Scholar 

  4. 4.

    N. Ibl, in “Advances in Electrochemistry and Electrochemical Engineering”, Vol. 2 edited by C. W. Tobias (Wiley, New York, 1962) p. 49.

    Google Scholar 

  5. 5.

    K. Aotani and D. Kagaku, J. Electrochem. Soc. J 18 (1950) 323.

    Google Scholar 

  6. 6.

    A. C. C. Tseung, S. P. Jiang, Y. Z. Chen and J. K. You, Brit. Provisional Pat. Appl. 88, 154943, 29 June 1988.

    Google Scholar 

  7. 7.

    A. C. C. Tseung, S. P. Jiang, Y. Z. Chen, and J. K. You, J. Mater. Sci. Lett. 9 (1990) 1294.

    Google Scholar 

  8. 8.

    S. P. Jiang, Y. Z. Chen, J. K. You, T. X. Chen and A. C. C. Tseung, J. Electrochem. Soc. 137 (1990) 3374.

    Google Scholar 

  9. 9.

    S. P. Jiang and A. C. C. Tseung, ibid. 137 (1990) 3381.

    Google Scholar 

  10. 10.

    Idem, ibid. 137 (1990) 3387.

    Google Scholar 

  11. 11.

    S. P. Jiang, C. Q. Cui and A. C. C. Tseung, ibid. 138 (1991) 3599.

    Google Scholar 

  12. 12.

    C. Q. Cui, S. P. Jiang and A. C. C. Tseung, ibid. 139 (1992) 60.

    Google Scholar 

  13. 13.

    Idem, ibid 139 (1992).

    Google Scholar 

  14. 14.

    S. P. Jiang, C. Q. Cui and A. C. C. Tseung, J. Mater. Sci. 26 (1991).

  15. 15.

    N. Ibl. R. Keller and K. Killer, in “Proceedings of the International Committee on Electrochemistry Thermodynamics and Kinetics (CITCE), 9th Meeting (Butterworths, London, 1959) p. 283.

    Google Scholar 

  16. 16.

    G. Wranglen, J. Electrochem. Soc. 97 (1950) 353.

    Google Scholar 

  17. 17.

    R. Aogaki and T. Makino, Electrochim Acta 26 (1981) 1509.

    Google Scholar 

  18. 18.

    A. R. Despic and K. I. Popov, in “Modern Aspects of Electrochemistry”, Vol. 7 edited by B. E. Conway and J. O' M. Bockris (Plenum Press, New York, 1972) p. 199.

    Google Scholar 

  19. 19.

    C. Q. Cui, S. P. Jiang and A. C. C. Tseung, J. Electrochem. Soc. 137 (1990) 3148.

    Google Scholar 

  20. 20.

    M. Miyata, K. Kobayashi, H. Wakayama, T. Miyabayashi, M. Yasuda and F. Hine, Surface Technol. 40 (1989) 472 (in Japanese).

    Google Scholar 

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Cui, C.Q., Tseung, A.C.C. Reactive deposition of ultrafine cobalt powders. JOURNAL OF MATERIALS SCIENCE 28, 461–468 (1993).

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  • Hydrogen
  • Polymer
  • Titanium
  • Cobalt
  • Electrode Surface