Skip to main content

Reactive deposition of ultrafine cobalt powders

Part II Effect of preparation conditions

Abstract

The particle size distributions of cobalt powders prepared by reactive deposition were examined and correlated with the deposition condition. In reactive deposition, a Co(OH)2 colloid layer was formed at the electrode surface upon reduction of dissolved oxygen. The colloid layer accelerated the decrease in interfacial Co2+ concentration and inhibited crystal growth of the metal, and was therefore instrumental in the formation of fine cobalt particles. The powders from reactive deposition were statistically a factor of two finer and of more uniform size distribution than those from normal electrodeposition. It was found that both the reactive deposition of cobalt powders and the reactive deposition of porous cobalt structures were driven by the same kinetic factors, namely the requirement of maintaining an effective presence of the Co(OH)2 colloid layer at the electrode surface. Hence a similar dependence on deposition conditions for both processes was obtained.

This is a preview of subscription content, access via your institution.

References

  1. 1.

    The Cobalt Development Institute (CDI), Cobalt News 89(2) (London 1989) 2.

    Google Scholar 

  2. 2.

    C. Q. Cui and A. C. C. Tseung, J. Mater. Sci. 28 (1993) 461.

    CAS  Article  Google Scholar 

  3. 3.

    S. P. Jiang, C. Q. Cui and A. C. C. Tseung, J. Electrochem. Soc. 138 (1991) 3599.

    CAS  Article  Google Scholar 

  4. 4.

    C. Q. Cui, S. P. Jiang and A. C. C. Tseung, ibid. 139 (1992) 60.

    CAS  Article  Google Scholar 

  5. 5.

    C. Q. Cui, S. P. Jiang and A. C. C. Tseung, ibid. 1276.

    CAS  Article  Google Scholar 

  6. 6.

    C. Q. Cui, S. P. Jiang and A. C. C. Tseung, ibid. 1535.

    CAS  Article  Google Scholar 

  7. 7.

    S. P. Jiang, Y. Z. Chen, J. K. You, T. X. Chen and A. C. C. Tseung, ibid. 137 (1990) 3374.

    CAS  Article  Google Scholar 

  8. 8.

    N. Ibl, in “Advances in Electrochemistry and Electrochemical Engineering”, Vol. 2, edited by C. W. Tobias (Wiley, New York, 1962) p. 49.

    Google Scholar 

  9. 9.

    M. Miyata, K. Kobayashi, H. Wakayama, T. Miyabayashi, M. Yasuda and F. Hine, Surf. Tech. 40 (1989) 472 (in Japanese).

    CAS  Google Scholar 

  10. 10.

    C. Q. Cui, S. P. Jiang and A. C. C. Tseung, J. Electrochem. Soc. 137 (1990) 3148.

    Article  Google Scholar 

Download references

Author information

Affiliations

Authors

Rights and permissions

Reprints and Permissions

About this article

Cite this article

Cui, C.Q., Lee, J.Y. & Tan, T.C. Reactive deposition of ultrafine cobalt powders. JOURNAL OF MATERIALS SCIENCE 29, 6495–6500 (1994). https://doi.org/10.1007/BF00354010

Download citation

Keywords

  • Cobalt
  • Dissolve Oxygen
  • Particle Size Distribution
  • Electrode Surface
  • Crystal Growth