Abstract
An in situ, noncontact, photothermal displacement interferometer for performing thermal diffusivity measurements on bulk and thin-film materials has been developed. Localized transient surface motion is generated through photothermoelastic coupling of a pulsed, heating laser beam to the sample under investigation. The maximum surface displacement is found to be linearly dependent on the laser power while the proportionality is a function of the thermal diffusivity. Both thin-film conductivity and film/substrate interface thermal resistance are derived from the measured, effective thermal conductivity by employing simple heat-flow analysis. Wedge-shaped Si films, vacuum deposited on single crystal Si wafers are studied with this technique. A sample with oxide layer removed by ion bombardment of the wafer surface prior to film deposition shows the same film conductivity as a sample film deposited on an as-cast wafer, while the uncleaned sample exhibits higher interface thermal resistance. It is found that the thin-film thermal conductivity is somewhat smaller than the bulk value. However, the existence of an interface thermal resistance, when combined with film thermal conductivity, can result in an effective thermal conductivity as low as two orders of magnitude lower than the bulk value.
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References
Exemplary references are R. Berman: Thermal Conduction in Solids (Clarendon, Oxford 1976);
J.E. Parrott, A.D. Stuckes: Thermal Conductivity of Solids (Pion, London 1975);
P.G. Klemens: Theory of the Thermal Conductivity of Solids, In: Thermal Conductivity, ed. by R.P. Tye (Academic, London, New York 1969) Vol. 1, pp. 1–68;
E.F. Steigmeier: Thermal Conductivity of Semi-conducting Materials, In: Thermal Conductivity, ed. by R.P. Tye (Academic, London, New York 1969) Vol. 2, pp. 203–251
D.L. Decker, L.G. Koshigoe, E.J. Ashley: Thermal Properties of Optical Thin Film Materials. In: Laser Induced Damage in Optical Materials: 1984, Natl. Bur. Stand. (U.S.), Spec. Publ. 727 (U.S. Government Printing Office, Washington, DC 1986) p. 291
E.T. Swartz, R.O. Pohl: Thermal Resistance at Interfaces. Appl. Phys. Lett. 51, 2200 (1987)
V.M. Abrosimov, B.N. Egorov, N.S. Lidorenko, I.B. Rubashov: Investigation of Thermal Conductivity of Thin Metallic Films. Sov. Phys. Solid State 11, 427 (1969)
B.T. Boiko, A.T. Pugachev, V.M. Bratsychin: Method for the Determination of the Thermophysical Properties of Evaporated Thin Films. Thin Solid Films 17, 157 (1973)
N. Savvides, H.J. Goldsmid: Measurement of Thermal Conductivity by a Parallel Flow Sandwich Technique Using the Peltier Effect. Phys. E 5, 553 (1972)
R.W. Powell: Experiments Using a Simple Thermal Comparator for Measurement of Thermal Conductivity, Surface Roughness and Thickness of Foils or of Surface Deposits. J. Sci. Instrum. 34, 485 (1957)
J.C. Lambropoulos, M.R. Jolly, C.A. Amsden, S.E. Gilman, M.J. Sinicropi, D. Diakomihalis, S.D. Jacobs: Thermal Conductivity of Dielectric Thin Films. J. Appl. Phys. 66, 4230 (1989)
T.R. Ogden, A.D. Rathsam, T. Gilchrist: Thermal Conductivity of Thick Anodic Oxide Coatings on Aluminum. Mater. Lett. 5, 84 (1987)
J.P. Roger, F. Lepoutre, D. Fournier, A.C. Boccara: Thermal Diffusivity Measurement of Micron-Thick Semiconductor Films by Mirage Detection. Thin Solid Films 155, 165 (1987)
A. Skumanich, H. Dersch, M. Fathallah, N.M. Amer: A Contactless Method for Investigating the Thermal Properties of Thin Films. Appl. Phys. A 43, 297 (1987)
N. Yacoubi, B. Girault, J. Fesquet: Determination of Absorption Coefficients and Thermal Conductivity of GaAlAs/GaAs Heterostructure Using a Photothermal Method. Appl. Opt. 25, 4622 (1986)
C.A. Paddock, G.L. Eesley: Transient Thermoreflectance from Thin Metal Films. Appl. Phys. 60, 285 (1986)
W.P. Leung, A.C. Tam: Thermal Diffusivity in Thin Films Measured by Noncontact Single-Ended Pulsed-Laser-Induced Thermal Radiometry: Opt. Lett. 9, 93 (1984)
I. Hatta, R. Kato, A. Maesono: Thermal Diffusivity Measurement of Thin Films by Means of an ac Calorimetric Method. Proc. 1st Asian Thermophy. Prop. Conf. (Beijing, China) p.310 (1986)
D. Ristau, J. Ebert: Development of a Thermographic Laser Calorimeter. Appl. Opt. 25, 4571 (1986)
K.L. Saenger: An Interferometric Calorimeter for Thin-Film Thermal Diffusivity Measurements. Appl. Phys. 65, 1447 (1989)
G. Rousset, L. Bertrand, P. Cielo: A Pulsed Thermoelastic Analysis of Photothermal Surface Displacements in Layered Materials. J. Appl. Phys. 57, 4396 (1985)
I. Suemune, H. Yamamoto, M. Yamanishi: Noncontact Photoacoustic Measurements of Semiconductors with Michelson Interferometry. J. Appl. Phys. 58, 615 (1985)
A. Rosencwaig, J. Opsal, W. L. Smith, D.L. Willenborg: Detection of Thermal Waves Through Optical Reflectance. Appl. Phys. Lett. 46, 1013 (1985)
R.M. White: Generation of Elastic Waves by Transient Surface Heating. J. Appl. Phys. 34, 3559 (1963)
J.D. Jackson: Classical Electrodynamics, 2nd edn. (Wiley, New York 1975)
H.S. Carslaw, J.C. Jaeger: Conduction of Heat in Solids, 2nd edn. (Oxford University Press, London 1959)
M.A. Olmstead, N.M. Amer, S. Kohn, D. Fournier, A.C. Boccara: Photothermal Displacement Spectroscopy: An Optical Probe for Solids and Surfaces. Appl. Phys. A 32, 141 (1983)
J.R. Dryden: The Effect of a Surface Coating on the Constriction Resistance of a Spot on an Infinite Half-Plane. J. Heat Transfer Trans ASME 105, 408 (1983)
D.K. Cohen, B. Little, F.S. Luecke: Techniques for Measuring 1-μm Diam Gaussian Beams. Appl. Opt. 23, 637 (1984)
H.J. Goldsmid, M.M. Kaila, G.L. Paul: Thermal Conductivity of Amorphous Silicon. Phys. Stat. Sol. (a) 76, K31 (1983)
C.K. Ong, E.H. Sin, H.S. Tan: Heat-Flow Calculation of Pulsed Excimer Ultraviolet Laser's Melting of Amorphous and Crystalline Silicon Surfaces: J. Opt. Soc. Am. B 3, 812 (1986)
H.C. Webber, A.G. Cullis, N.G. Chew: Computer Simulation of High Speed Melting of Amorphous Silicon. Appl. Phys. Lett. 43, 669 (1983)
D.H. Lowndes, R.F. Wood: Studies of Pulsed Laser Melting and Rapid Solidification Using Amorphous Silicon. J. Luminescence 30, 395 (1985)
H.A. Schafft, J.S. Suehle, P.G.A. Mirel: Thermal Conductivity Measurements of Thin-Film Silicon Dioxide. In: Proc. 1989 Int'l Conf. Microelectronic Test Structures (IEEE, New York 1989) Vol. 2, p. 121
Z.L. Wu, H. Groenbeck, Z.X. Fan: Thermal Transport Studies of Diamond Thin Films, to be published in 22nd Boulder Damage Symposium on Optical Materials for High Power Lasers
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Currently supported by the LLE fellowship
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Kuo, B.S.W., Li, J.C.M. & Schmid, A.W. Thermal conductivity and interface thermal resistance of Si film on Si substrate determined by photothermal displacement interferometry. Appl. Phys. A 55, 289–296 (1992). https://doi.org/10.1007/BF00348399
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DOI: https://doi.org/10.1007/BF00348399