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Thick gold-film deposition by high-repetition visible pulsed-laser chemical vapor deposition

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Abstract

A highly conductive gold film, over 10 μm-thick with well-controlled linewidth, has been successfully deposited from dimethyl-gold-acetylacetonate and its fluorinated derivative by pyrolytic CVD (Chemical Vapor Deposition) with a high-repetition, visible, pulsed laser. The thermal damage to the polyimide substrate has been substantially suppressed by reducing the thermal diffusion length within 0.2 μm in pulsed-laser-induced transient heating, in contrast to the cw laser-CVD scheme. Reproducible and low contact resistance as low as 0.5 Ω between the written line and the existing gold line has been obtained. Sufficiently tough adhesion to polyimide has been observed for the deposit from dimethyl-gold-acetylacetonate. Reasonable agreement has been obtained between the observed deposition characteristics and analytical results for precursor supply rate and temperature increase during short-pulse irradiation.

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Authors and Affiliations

  1. Opto-Electronics Research Laboratories, NEC Corporation, 4-1-1 Miyazaki, Miyamae-ku, 216, Kawasaki, Japan

    Y. Morishige & S. Kishida

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  1. Y. Morishige
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  2. S. Kishida
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Morishige, Y., Kishida, S. Thick gold-film deposition by high-repetition visible pulsed-laser chemical vapor deposition. Appl. Phys. A 59, 395–399 (1994). https://doi.org/10.1007/BF00331718

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  • DOI: https://doi.org/10.1007/BF00331718

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