Abstract
Chemical reactions induced by CO2-laser radiation in mixtures of silane and hexafluoroacetone afford various gaseous silicon- and carbon-containing compounds and result in deposition of microstructures of carbon, C/F/O and Si/C/O/F materials. These products are suggested to be formed by a variety of exothermic reactions initiated through SiH4-photosensitized decomposition of hexafluoroacetone. Silane is shown to be a very potent reagent for the reduction of C-F bonds.
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Pola, J., Papoušková, Z., Bastl, Z. et al. Laser-induced chemistry in silane-hexafluoroacetone mixtures for production of novel Si/C/F/O and C/F/O materials. Appl. Phys. B 56, 313–319 (1993). https://doi.org/10.1007/BF00325222
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DOI: https://doi.org/10.1007/BF00325222